| 摘要 |
<p>A self-hydrolytic monodisperse thin film forming material consisting of only a semiconductor-quality ultrapure water and high-purity tetraethoxysilane, and mixed into a colloidal form free from phase separation for at least 15 min by a ultrasonic homogenizer with a longitudinal oscillation amplitude of 20 νm, a monodisperse pigment formed by coating with the thin film forming material, and cosmetics containing the monodisperse pigment. A gentle self-hydrolytic treatment without blending a catalyst with an organic solvent can fully fill and cover a discontinuous fine structure of pigment particles to prevent eluting of various ions, and improve various physical properties such as dispersibility.</p> |
