| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a reticle used for a projection exposure device which is hardly affected by the remaining berrations of a projection optical system or the thermal aberrations by exposure and makes stable focus measurement possible. SOLUTION: The reticle is provided with marks having repetitive patterns of a period P satisfying 2λ/(NAβ)<P<16λ/(NAβ) when the numerical aperture of the projection optical system is defined as NA, a projection magnification asβand an exposure wavelength asλ.</p> |
