| 摘要 |
PROBLEM TO BE SOLVED: To firstly provide a production method, with which a multi-light source forming reflection mirror having a reflection plane shape as designed can be produced with high yield, and further to secondly provide a semiconductor exposing device, with which throughput is more improved. SOLUTION: In the production method for reflection mirror for forming a plurality of elementary reflection planes in which one part of a prescribed curved surface is made into plane shape, this method is composed of a process for working so that an outer form or inner diameter has a prescribed curvature radius, a process for cutting a member which is worked into prescribed curvature radius, into prescribed size and a process for locating the member cut in the prescribed size at a prescribed position. |
