WAFER PRE-ALIGNMENT SYSTEM USED IN STEPPER PROCESSING

摘要

PURPOSE: An orienter flat-zone unit is provided to reduce a local focus of a stepper by removing previously particles remaining on a wafer before moving to a wafer stage. CONSTITUTION: The orienter flat-zone unit(100) for aligning a wafer flat-zone comprises a turntable(110) for loading a wafer, a rotation part(120) for rotating the turntable(110), and a particle removing unit(132). The particle removing unit(132) removes metallic particles remaining on the wafer loaded on the turntable(110) by using an electrostatic force. Preferably, a solenoid coil for generating the electrostatic force is used as the particle removing unit(132).