发明名称 SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF
摘要 A photoresist composition comprising at least one acetal polymer having a silicon substituent; provided that the silicon substituent is not directly attached to the acetal functionality, thereby providing high resolution, improved DOF, and improved dimensional stability under metrology conditions.
申请公布号 WO02082184(A1) 申请公布日期 2002.10.17
申请号 WO2002US10639 申请日期 2002.04.04
申请人 ARCH SPECIALTY CHEMICALS, INC. 发明人 BLAKENEY, ANDREW, JOSEPH;MALIK, SANJAY;DILOCKER, STEPHANIE;FERRI, JOHN;EISELE, JEFFERY
分类号 C08F8/42;C08F30/08;G03F7/004;G03F7/039;G03F7/075;G03F7/11;G03F7/26;H01L21/027;(IPC1-7):G03F7/004;C08F16/12;C08G77/20;C08G77/04;C08G77/00 主分类号 C08F8/42
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