发明名称 |
SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF |
摘要 |
A photoresist composition comprising at least one acetal polymer having a silicon substituent; provided that the silicon substituent is not directly attached to the acetal functionality, thereby providing high resolution, improved DOF, and improved dimensional stability under metrology conditions.
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申请公布号 |
WO02082184(A1) |
申请公布日期 |
2002.10.17 |
申请号 |
WO2002US10639 |
申请日期 |
2002.04.04 |
申请人 |
ARCH SPECIALTY CHEMICALS, INC. |
发明人 |
BLAKENEY, ANDREW, JOSEPH;MALIK, SANJAY;DILOCKER, STEPHANIE;FERRI, JOHN;EISELE, JEFFERY |
分类号 |
C08F8/42;C08F30/08;G03F7/004;G03F7/039;G03F7/075;G03F7/11;G03F7/26;H01L21/027;(IPC1-7):G03F7/004;C08F16/12;C08G77/20;C08G77/04;C08G77/00 |
主分类号 |
C08F8/42 |
代理机构 |
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代理人 |
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