发明名称 |
Electron beam irradiation apparatus |
摘要 |
An electron beam irradiation apparatus includes an electron beam system for directing electrons into an irradiation zone. The electron beam system and the irradiation zone are configured for irradiating outwardly exposed surfaces of a 3-dimensional article passing through the irradiation zone from different directions with the electrons from the electron beam system.
|
申请公布号 |
US2002149321(A1) |
申请公布日期 |
2002.10.17 |
申请号 |
US20020097192 |
申请日期 |
2002.03.12 |
申请人 |
ADVANCED ELECTRON BEAMS, INC. |
发明人 |
AVNERY TZVI |
分类号 |
G21K5/04;A61L2/08;B05C9/12;B05D3/06;G21K1/10;G21K5/10;(IPC1-7):G09G3/10 |
主分类号 |
G21K5/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|