发明名称 NEGATIVE RESISTANCE FIELD EFFECT ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a negative resistance field effect element, capable of developing negative characteristics by a low power source voltage (low drain voltage) and taking a high PVCR. SOLUTION: An InAlAs barrier layer 12 having a trench TR of opposed one side face of a plane A (111) and another side face of a plane B (331) is formed on an InP substrate 11 having an asymmetrical V-groove of one side face of a plane (100) and another side face of a plane (011). An InGaAs quantum wire 13 having a relatively narrow energy band gap as a high mobility channel is formed at the bottom of the trench. An InAlAs modulation-doped layer 20 having a relatively wide energy band gap as a low mobility channel is formed thereon. A source electrode 42 and a drain electrode 43 isolated from each other along a length direction of the quantum wire 13 electrically conducted with the high mobility channel via a contact layer 30, and a gate electrode 41 opposed to the channel 20 via a Schottky junction interposed via an insulating layer between the electrode 42 and the electrode 43 are provided.
申请公布号 JP2002299637(A) 申请公布日期 2002.10.11
申请号 JP20010094464 申请日期 2001.03.29
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;JAPAN SCIENCE & TECHNOLOGY CORP 发明人 OGURA MUTSURO;SUGAYA TAKEYOSHI;CHO KIREN;SUGIYAMA YOSHINOBU
分类号 H01L29/872;H01L21/338;H01L29/04;H01L29/06;H01L29/12;H01L29/417;H01L29/47;H01L29/775;H01L29/80;H01L29/812;(IPC1-7):H01L29/80 主分类号 H01L29/872
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