发明名称 |
NEGATIVE RESISTANCE FIELD EFFECT ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a negative resistance field effect element, capable of developing negative characteristics by a low power source voltage (low drain voltage) and taking a high PVCR. SOLUTION: An InAlAs barrier layer 12 having a trench TR of opposed one side face of a plane A (111) and another side face of a plane B (331) is formed on an InP substrate 11 having an asymmetrical V-groove of one side face of a plane (100) and another side face of a plane (011). An InGaAs quantum wire 13 having a relatively narrow energy band gap as a high mobility channel is formed at the bottom of the trench. An InAlAs modulation-doped layer 20 having a relatively wide energy band gap as a low mobility channel is formed thereon. A source electrode 42 and a drain electrode 43 isolated from each other along a length direction of the quantum wire 13 electrically conducted with the high mobility channel via a contact layer 30, and a gate electrode 41 opposed to the channel 20 via a Schottky junction interposed via an insulating layer between the electrode 42 and the electrode 43 are provided. |
申请公布号 |
JP2002299637(A) |
申请公布日期 |
2002.10.11 |
申请号 |
JP20010094464 |
申请日期 |
2001.03.29 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;JAPAN SCIENCE & TECHNOLOGY CORP |
发明人 |
OGURA MUTSURO;SUGAYA TAKEYOSHI;CHO KIREN;SUGIYAMA YOSHINOBU |
分类号 |
H01L29/872;H01L21/338;H01L29/04;H01L29/06;H01L29/12;H01L29/417;H01L29/47;H01L29/775;H01L29/80;H01L29/812;(IPC1-7):H01L29/80 |
主分类号 |
H01L29/872 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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