METHOD FOR FABRICATING THIN FILM TYPE ELECTRO-LUMINESCENCE DISPLAY DEVICE AND THIN FILM TYPE ELECTRO-LUMINESCENCE DISPLAY DEVICE

摘要

PURPOSE: A method for fabricating a thin film type electro-luminescence display device and a thin film type electro-luminescence display device are provided to improve reliability of the electro-luminescence display device by performing all processes within one vacuum bath including an ion beam source. CONSTITUTION: A column electrode as an ITO(Indium Tin Oxide) transparent electrode(12) is formed on a glass or a ceramic substrate(11). A lower insulating layer is formed on the ITO transparent electrode(12) by depositing oxides of SiO2(13a) and Ta2O5(13b) on the ITO transparent electrode(12). A light emitting layer(14) is formed on the lower insulating layer. A plasma process is performed by implanting a mixed gas of oxygen and argon. An upper insulating layer including Ta2O5(15b) and SiO2(15a) is formed on the light emitting layer(14). A metal electrode(16) is formed on the upper insulating layer.