BASIC CELL, SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, AND METHOD AND DEVICE FOR WIRING

摘要

PROBLEM TO BE SOLVED: To provide a basic cell that can improve the degree of freedom of wiring at the time of laying out a functional circuit block or a semiconductor integrated circuit device by utilizing the cell, and to provide a semiconductor integrated circuit device and a method and device for wiring. SOLUTION: The connecting terminals 2 and 3 of the basic cell 1 are used for supplying a power supply voltage VDD and a ground potential VSS to N- and P-type well regions. The terminals 2 and 3 can be constituted as contact structures between a metallic wiring layer and the N- and P-type well regions and, in addition, as stack VIA structures between many metallic wiring layers and the N- and P-type well regions in accordance with the manufacturing process of the semiconductor integrated circuit device that realizes the basic cell 1. In the basic cell 1, the connecting terminals 2 and 3 and the power supply voltage VDD and ground potential VSS supplied to two PMOS and NMOS transistors are not arranged.