LITHOGRAPHIC APPARATUS, METHOD FOR FABRICATING DEVICE AND DEVICES FABRICATED THEREBY

摘要

PURPOSE: A method for fabricating a device is provided to improve the image quality as a whole by increasing one component of aberration of a lithographic projection apparatus so that the effect of another aberration is decreased. CONSTITUTION: The aberration of the projection system of the lithographic projection apparatus is obtained in terms of the Zernike expansion. The field distribution of displacement error and focal plane distortion of the projected image are calculated on the basis of the Zernike aberration and sensitivity coefficients which quantify the relationship between Zernike aberration components and the error in the image. A calculation is performed to determine the compensation to apply to the apparatus in order to minimize the error in the image. The compensation is applied to the apparatus.