发明名称 Measuring pattern for measuring width of wire in semiconductor device
摘要 In order to measure a width of a wire a measuring pattern for the width of the wire is prepared. The measuring pattern includes: a first pattern with a first width; a second pattern connected to the first pattern and having a second width wider than the first width; and a third pattern connected to the second pattern and having a third width narrower than the first width. The first pattern, the second pattern and the third pattern are made of same material. The first pattern through a power source is connected to the third pattern. A first pair of probes are disposed on the first pattern and then are connected to a first voltmeter. A distance between the first pair of probes is a first distance wider than the first width. A second pair of probes are disposed on the second pattern and then are connected to a second voltmeter. A distance between the second pair of probes is a second distance wider than the first width. Thereafter the first width using gauged voltage at the first voltmeter and the second voltmeter is determined. The second width is more substantially ten times the first width and the third width is such narrow that current therethrough is uniform.
申请公布号 US6462565(B1) 申请公布日期 2002.10.08
申请号 US20000644992 申请日期 2000.08.24
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM KIL HO;SHIN KANG SUP;KIM JONG IL
分类号 G01B7/02;G01B21/02;H01L21/66;(IPC1-7):G01R27/14 主分类号 G01B7/02
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