发明名称 NEUTRAL PARTICLE BEAM TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a neutral particle beam treatment device which can apply a large-bore beam to a substance to be treated, at low-cost and compact constitution, and is hard to damage the substance to be treated. SOLUTION: This neutral particle beam treatment device possesses a plasma generation beam 10 which generates positive ions and/or negative ions in plasma, a pair of electrodes 5 and 6 which face each other including the plasma generated by that plasma generation means, and a voltage source 102 which applies voltage between those electrodes. The above electrodes 5 and 6 in a pair accelerate the positive ions and/or negative ions generated by the above plasma generation means, and the positive ions or negative ions become neutral particles 4 being neutralized while flying within the plasma 7 between the electrode in a pair toward the substance to be treated, and the accelerated neutral particles are applied to the substance X to be treated through the electrode 6 on the side of the substance to be treated.
申请公布号 JP2002289582(A) 申请公布日期 2002.10.04
申请号 JP20010088860 申请日期 2001.03.26
申请人 EBARA CORP 发明人 ICHIKI KATSUNORI;YAMAUCHI KAZUO;HIYAMA HIROKUNI;SAGAWA SEIJI
分类号 H05H1/46;B01J19/08;C23C14/32;C23C16/50;H01J27/16;H01J37/08;H01J37/317;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H05H3/02 主分类号 H05H1/46
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