发明名称 MULTI-LAYER STRUCTURE SEMICONDUCTOR, DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an MIS type field effect transistor small in the effective area of the device, small in on-resistance during operation and capable of large current operation in high voltage resistance. SOLUTION: One or a plurality of field effect transistors are layered in the thickness direction of a multi-layer film for a basic unit planarly juxtaposing and arranging one or the plurality of the field effect transistors forming a gate electrode, a source electrode and a drain electrode on the surface of the semiconductor multi-layer film, and the gate electrode, the source electrode and the drain electrode of each field effect transistor are connected respectively.
申请公布号 JP2002289774(A) 申请公布日期 2002.10.04
申请号 JP20010090323 申请日期 2001.03.27
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 YOSHIDA KIYOTERU;WADA TAKAHIRO;TAKEHARA HIRONARI
分类号 H01L29/78;H01L21/338;H01L27/00;H01L27/12;H01L29/778;H01L29/786;H01L29/812;(IPC1-7):H01L27/00 主分类号 H01L29/78
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