| 摘要 |
An X-ray exposure apparatus for raising the efficiency of utilization of all radiant energy possessed by X rays includes a point-source X-ray source device (101); a first collimator (110) to a third collimator (130) for varying at least one of angle and intensity of X rays generated by the point-source X-ray source device; and a first exposure unit 119, second exposure unit 129 and third exposure unit 139, which correspond to respective ones of the collimators, for transferring patterns on masks (113, 123, 133) to wafers (114, 124, 134) using X rays emitted from respective ones of the collimators.
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