发明名称 |
Reduction of inorganic contaminants in polymers and photoresist compositions comprising same |
摘要 |
The present invention provides polymers which are substantially or completely free of inorganic contaminants and the use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting resists. Polymers of the invention also are suitable for use as a resin component for antireflective coating compositions (ARCs). More particularly, the invention provides methods for reducing such contaminants in polymerization initiators, particularly free radical initiators.
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申请公布号 |
US2002142246(A1) |
申请公布日期 |
2002.10.03 |
申请号 |
US20010034756 |
申请日期 |
2001.12.27 |
申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
GRONBECK DANA A.;COLEY SUZANNE;TRUONG CHI Q.;PANDYA ASHISH |
分类号 |
G03F7/004;G03F7/038;G03F7/039;G03F7/09;(IPC1-7):G03F7/038 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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