| 摘要 |
A method of manufacturing an array substrate for a liquid crystal display device including the steps of forming a gate line and a gate electrode on a substrate by forming a metal material on the substrate and patterning it; forming a gate insulating layer on the substrate; forming an active layer and an ohmic contact layer on the gate insulating layer; forming a data line, a source electrode and a drain electrode on the substrate; forming a passivation layer by depositing an insulating material on the substrate, forming a drain contact hole by patterning the passivation layer, the drain contact hole exposing a part of the drain electrode; forming a transparent metal layer on the passivation layer; forming a photo-resist layer on the transparent metal layer; performing a light exposure process by disposing a mask over the photo-resist layer, the mask including a light blocking portion, a slit portion and a light transmission portion, and forming a pixel electrode by developing the photo-resist layer exposed to light and etching the exposed transparent metal layer.
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