发明名称 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a positive type photosensitive resin composition giving a light-colored film after curing and less liable to discoloration even in a heat treatment process after curing. SOLUTION: The positive type photosensitive resin composition comprises 100 pts.wt. polyamide (A) of formula (I) having phenolic hydroxyl groups, 1-100 pts.wt. photosensitive diazoquinone compound (B) and 1-20 pts.wt. phosphorus compound (C).
申请公布号 JP2002278051(A) 申请公布日期 2002.09.27
申请号 JP20010077602 申请日期 2001.03.19
申请人 SUMITOMO BAKELITE CO LTD 发明人 BANBA TOSHIO;HIRANO TAKASHI
分类号 G03F7/004;C08G69/42;C08K5/23;C08K5/49;C08L77/00;G03F7/037;G03F7/075;H01L21/027 主分类号 G03F7/004
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