发明名称 |
POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION AND SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a positive type photosensitive resin composition giving a light-colored film after curing and less liable to discoloration even in a heat treatment process after curing. SOLUTION: The positive type photosensitive resin composition comprises 100 pts.wt. polyamide (A) of formula (I) having phenolic hydroxyl groups, 1-100 pts.wt. photosensitive diazoquinone compound (B) and 1-20 pts.wt. phosphorus compound (C). |
申请公布号 |
JP2002278051(A) |
申请公布日期 |
2002.09.27 |
申请号 |
JP20010077602 |
申请日期 |
2001.03.19 |
申请人 |
SUMITOMO BAKELITE CO LTD |
发明人 |
BANBA TOSHIO;HIRANO TAKASHI |
分类号 |
G03F7/004;C08G69/42;C08K5/23;C08K5/49;C08L77/00;G03F7/037;G03F7/075;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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