| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type photosensitive composition excellent in sensitivity and resolving power in microphotofabrication using far ultraviolet light, particularly ArF excimer laser light. SOLUTION: The positive type photosensitive composition contains a specified photo-acid generator which generates an acid when irradiated with active light or radiation and a resin which has an alicyclic hydrocarbon structure, is decomposed by the action of the acid and increases its solubility in an alkali developing solution. |
