CHEMICAL AMPLIFICATION TYPE POSITIVE TYPE RESIST COMPOSITION

摘要

PURPOSE: To provide a chemical amplification type positive type resist composition containing a resin component and an acid generator, suitable for excimer laser lithography using ArF, KrF or the like, excellent in performance balance of resolution and sensitivity and having high dry etching resistance. CONSTITUTION: The chemical amplification type positive type resist composition contains an alkali-insoluble resin having a polymerization unit derived from a monomer of formula (I) and made alkali-soluble by the action of an acid and an acid generator.