发明名称 DEVICE AND METHOD FOR TREATING SUBSTRATE, SUBSTRATE HOLDER, AND SUBSTRATE CARRIER
摘要 <p>PROBLEM TO BE SOLVED: To perform treatment, such as exposure, etc., on a substrate, without producing a defective substrate by suppressing excessive electrification, even when the substrate stays on a substrate holder. SOLUTION: When the substrate stays on the substrate holder over a long time, the vacuum-chucking force of the holder exerted for holding the substrate is canceled or weakened. Alternatively, a non-contacting state is produced between the substrate holder and substrate by canceling the vacuum-holding force, and at the same time, lifting the substrate by means of a substrate-lifting/ lowering mechanism.</p>
申请公布号 JP2002270678(A) 申请公布日期 2002.09.20
申请号 JP20010065609 申请日期 2001.03.08
申请人 NIKON CORP 发明人 MATSUDA TOSHIKAZU
分类号 G02F1/13;B65G49/06;G03F7/20;H01L21/027;H01L21/677;H01L21/683;(IPC1-7):H01L21/68 主分类号 G02F1/13
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