发明名称 |
Impedance matching circuit for inductively coupled plasma source |
摘要 |
An impedance matching circuit for a plasma source includes: a first network including: a first coil; and a RF power supply applying a first voltage to the first coil; and a second network including; a second coil grounded having a second voltage, the second voltage being lower than the first voltage; first and second reactive elements, one end portion of the first and second reactive elements being connected to each end portion of the second coil, respectively; and a load connected to the other end portions of the first and second reactive elements, phases at two end portions of the load being different from each other.
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申请公布号 |
US2002130110(A1) |
申请公布日期 |
2002.09.19 |
申请号 |
US20020100983 |
申请日期 |
2002.03.19 |
申请人 |
KWON GI-CHUNG;BYUN HONG-SIK;LEE SUNG-WEON;KIM HONG-SEUB;HAN SUN-SEOK;KO BU-JIN;KIM JOUNG-SIK |
发明人 |
KWON GI-CHUNG;BYUN HONG-SIK;LEE SUNG-WEON;KIM HONG-SEUB;HAN SUN-SEOK;KO BU-JIN;KIM JOUNG-SIK |
分类号 |
H05H1/30;H01J37/32;H05H1/46;(IPC1-7):B23K10/00 |
主分类号 |
H05H1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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