DRAWING CONDITION PREPARING METHOD FOR PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a drawing condition preparing method for a photomask which reduces the load on the management of drawing conditions and makes it possible to vary the values of parameters of the drawing conditions without any trouble. SOLUTION: A server dedicated to the management is equipped with parameter files which are represented as parameters for specific drawing device management and correspond to determination factors and directory files by systems for managing the parameter files by the systems and manages the parameter files in the form of a database for parameter management; when drawing conditions used by a driving device are prepared, a corresponding parameter file is read out of the database for parameter management, and copied and transferred to the computer side of the drawing device, the transferred parameter file is managed together in a dedicated drawing condition directory as a drawing condition data file, and the drawing device is made to select a specific drawing condition data file managed in the dedicated drawing condition directory.