MASK HANDLING METHOD, AND MASK AND DEVICE OR APPARATUS COMPRISING GRIPPER THEREFORE, DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY

摘要

PURPOSE: A mask handling method, and mask and device or apparatus comprising a gripper therefore, device manufacturing method and device manufactured thereby are provided to handle a reflection mask suitable for patterning a projection beam of electromagnetic rays by including three brackets disposed on the outer circumference of a mask for a lithographic projection apparatus. CONSTITUTION: Three brackets(10) are arranged on the outer circumference of the mask for the lithographic projection apparatus. The brackets are provided with the grooves(11a,11b) directed to a common imaginary point and are intend to cooperate with three pins(21b) provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top(22b) for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.