| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a spot resist film peeling machine which can continuously perform etching added to a quartz substrate 1 and peel a resist film pattern 3' of only a pattern for phase difference measurement without repeating the formation of a resist film, electron beam drawing, and development when it becomes evident that the depth of a shifter is insufficient when a Revenson type phase shift mask 60 is manufactured. SOLUTION: This machine is equipped with at least (1) a stage part 20 composed of a frame 21 which has an opening part, an X-Y stage 22, and a holder stopper 23, (2) an image pickup and controller part 30, (3) a liquid chemicals injection part 40 composed of a conic cover 41, a liquid chemicals nozzle 42, and a supporter 43, and (4) a liquid chemicals supply and collection part 50.</p> |
