| 摘要 |
<p>A precursor composition for an alkali-developable positive photosensitive resin. It is characterized by comprising the following (a), (b1) or (b2), and (c). (a) A polyamic acid ester and/or polyamic acid polymer which are soluble in an aqueous alkali solution. (b1) A heat-crosslinkable compound which contains a phenolic hydroxyl group and a methylol group substituted by an organic group R1 and represented by the general formula (1) (provided that R1 is not hydrogen) (1) (b2) A heat-crosslinkable compound which contains a urea-derived organic group substituted by organic groups R1 and represented by the general formula (2). (2) (c) An esterified quinone diazide compound.</p> |
