METHOD FOR AMENDING EMULSION MASK PATTERN DEFECT

摘要

PROBLEM TO BE SOLVED: To enable defect of a light shielding pattern to be efficiently amended by an amending device of simple structure without giving thermal damage to a light translucent emulsion film. SOLUTION: In the emulsion mask in which a periodic pattern constituted by repeatedly arranging light shielding patterns P of a prescribed shape is formed on a light translucent emulsion film E coated on a transparent glass plate G, when a defective part K which is generated in the light shielding pattern P and partially transmits light is amended, a light shielding amending liquid containing a UV curing resin is applied onto a defective pattern in which the defective part K is generated beyond a range covering the defective part K, the applied liquid is irradiated with a laser beam of a UV region (third or fourth higher harmonic wave of YAG laser) to cure the amending liquid and to form a coating film. Then an overflowed part of the coating film beyond a pattern form is further irradiated with the same laser beam to cause photolysis and to be removed.