发明名称 |
LIFT TYPE SUBSTRATE TREATMENT DEVICE, AND SUBSTRATE TREATMENT SYSTEM WITH THE SUBSTRATE TREATMENT DEVICE |
摘要 |
A lift type substrate treatment device having a function to transfer a substrate from one to the other side of a treatment line and capable of treating the substrate during transfer, and a substrate treatment system having the lift type substrate treatment device; the lift type substrate treatment device, comprising a cabinet-like cover body (11) having a substrate inlet (11a) and a substrate outlet (11b) provided therein parallel with each other in vertical direction, a transfer supporting means forming a treatment mechanism (20) installed in the cover body (11), supportedly accepting the substrate carried in from the substrate inlet (11a), and discharging the substrate from the substrate outlet (11b), a support frame (21) for supporting the transfer/supporting means, the treatment mechanism (20) disposed above the transfer/supporting means and having a treatment fluid discharge means for discharging the treatment fluid onto the substrate, and a lifting mechanism (40) for supportedly lifting the treatment mechanism (20) in vertical direction to move the treatment mechanism (20) to the substrate inlet (11a) and the substrate outlet (11b).
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申请公布号 |
WO02069392(A1) |
申请公布日期 |
2002.09.06 |
申请号 |
WO2002JP01583 |
申请日期 |
2002.02.21 |
申请人 |
SUMITOMO PRECISION PRODUCTS CO., LTD. |
发明人 |
MIZUKAWA, SHIGERU;NAKATA, KATSUTOSHI;MATSUMOTO, SHUNJI |
分类号 |
B65G49/06;H01L21/027;H01L21/304;H01L21/306;H01L21/677;(IPC1-7):H01L21/68;B65G49/07 |
主分类号 |
B65G49/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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