发明名称 LIFT TYPE SUBSTRATE TREATMENT DEVICE, AND SUBSTRATE TREATMENT SYSTEM WITH THE SUBSTRATE TREATMENT DEVICE
摘要 A lift type substrate treatment device having a function to transfer a substrate from one to the other side of a treatment line and capable of treating the substrate during transfer, and a substrate treatment system having the lift type substrate treatment device; the lift type substrate treatment device, comprising a cabinet-like cover body (11) having a substrate inlet (11a) and a substrate outlet (11b) provided therein parallel with each other in vertical direction, a transfer supporting means forming a treatment mechanism (20) installed in the cover body (11), supportedly accepting the substrate carried in from the substrate inlet (11a), and discharging the substrate from the substrate outlet (11b), a support frame (21) for supporting the transfer/supporting means, the treatment mechanism (20) disposed above the transfer/supporting means and having a treatment fluid discharge means for discharging the treatment fluid onto the substrate, and a lifting mechanism (40) for supportedly lifting the treatment mechanism (20) in vertical direction to move the treatment mechanism (20) to the substrate inlet (11a) and the substrate outlet (11b).
申请公布号 WO02069392(A1) 申请公布日期 2002.09.06
申请号 WO2002JP01583 申请日期 2002.02.21
申请人 SUMITOMO PRECISION PRODUCTS CO., LTD. 发明人 MIZUKAWA, SHIGERU;NAKATA, KATSUTOSHI;MATSUMOTO, SHUNJI
分类号 B65G49/06;H01L21/027;H01L21/304;H01L21/306;H01L21/677;(IPC1-7):H01L21/68;B65G49/07 主分类号 B65G49/06
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