发明名称 METHODS OF PRODUCING SUBSTANTIALLY ANATASE-FREE TITANIUM DIOXIDE WITH SILICON HALIDE ADDITION
摘要 <p>The present invention provides methods of producing substantially anatase-free titanium dioxide by mixing titanium tetrachloride with a silicon compound to form an admixture, and introducing the admixture and oxygen into a reaction zone to produce the substantially anatase-free titanium dioxide. The reaction zone has a pressure of greater than 55 psig.</p>
申请公布号 WO2002066378(A2) 申请公布日期 2002.08.29
申请号 US2001051101 申请日期 2001.11.13
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