发明名称 |
CATADIOPTRIC PROJECTION SYSTEM FOR 157 NM LITHOGRAPHY |
摘要 |
A photolithographic reduction projection catadioptric objective includes a first optical group G1 including an even number of at least four mirrors M1-M6; and a second at least substantially dioptric optical group G2 imageward than the first optical group G1 including a number of lenses E4-E13. The first optical group G1 provides compensative axial aberrative correction for the second optical group G2 which forms an image with a numerical aperture of at least substantially 0.65, and preferably at least 0.70 or 0.75. Six mirror examples are shown. |
申请公布号 |
WO0244786(A3) |
申请公布日期 |
2002.08.29 |
申请号 |
WO2001EP13851 |
申请日期 |
2001.11.28 |
申请人 |
CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIE;HUDYMA, RUSSELL |
发明人 |
HUDYMA, RUSSELL |
分类号 |
G02B13/24;G02B17/08;G03F7/20;H01L21/027 |
主分类号 |
G02B13/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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