发明名称 |
METHOD FOR PROCESSING SUBSTRATE |
摘要 |
PURPOSE: A method for processing a substrate is provided to remove deionized water and moisture as well as pollutants and particles from a surface of a substrate. CONSTITUTION: A liquid reaction container(10) is filled with deionized water by a deionized water supply/discharge unit(11). The deionized water is discharged to a pocket(13). A plurality of substrates(100) are loaded by an up-down unit(30). The substrates(100) are soaked in the deionized water by the up-down unit(30). A gas reaction container(20) is transferred from a loading/unloading stage(50) to the liquid reaction container(10) by a transfer robot unit(40). A dry gas and a carrier gas are supplied to the gas reaction container(20) through a gas supply unit(21). Pollutants and particles are removed from surfaces of the substrates(100) by the deionized water. A dry process is performed. The substrates(100) are transferred to the loading/unloading stage(50).
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申请公布号 |
KR20020068660(A) |
申请公布日期 |
2002.08.28 |
申请号 |
KR20010008826 |
申请日期 |
2001.02.21 |
申请人 |
APET CO., LTD. |
发明人 |
AHN, JONG PAL;KIM, DAE HUI;KIM, DEOK HO;KIM, GYEONG JIN |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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