| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymer compound which is sensitive to high-energy rays, is excellent in sensitivity particularly in a wavelength range of 170 nm or lower, and has improved transparency and excellent plasma-etching resistance. SOLUTION: This polymer compound contains repeating units represented by formulas (1a) and (1c) or represented by formulas (1a), (1b), and (1c) [wherein R1, R2, R5, R6, and R7 are each H, F or a fluorinated alkyl group; R3 is F or a fluorinated alkyl group; R4 and R8 are each an acid-unstable group, an adhesive group, H or an optionally fluorinated alkyl group; R9a, R9b, R10a, and R10b are each H, OH, an optionally fluorinated alkyl group, (CH2)eCO2R11 or (CH2)eC(R12)2(OR11); R11 is an acid-unstable group, an adhesive group, H or an optionally fluorinated alkyl group; R12 is a fluorinated alkyl group; 0<a<1; 0<=b<1; 0<c<1; 0<a+b+c<=1; d is 0 or 1; and 0<=e<=6]. |
