发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR HARD COAT AGENT, AND FILM HAVING ITS CURED FILM
摘要 PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition capable of being cured by radioactive rays, having good adhesion to a plastic, usable for a thick film coating because of little curling properties, hardly causing crack and suitable for hard coat, and further to prepare a film having the cured film thereof. SOLUTION: The photosensitive resin composition for a hard coat agent is characterized in that the composition contains (A) a (meth)acrylic ester mixture of a reaction product of (meth)acrylic acid with (I) a mixture of (a) dipentaerythritol, (b) tripentaerythritol, (c) tetrapentaerythritol and a pentaerythritol as an optional component, and (B) a photopolymerization initiator.
申请公布号 JP2002235018(A) 申请公布日期 2002.08.23
申请号 JP20010033023 申请日期 2001.02.09
申请人 NIPPON KAYAKU CO LTD 发明人 MATSUO YUICHIRO;KANO HIROKAZU;KIYOYANAGI NORIKO
分类号 B32B27/30;C09D4/02;C09D5/00;C09D175/16;(IPC1-7):C09D4/02 主分类号 B32B27/30
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