发明名称 GAS LASER EQUIPMENT AND METHOD FOR ALIGNING NARROW- BAND REALIZING UNIT IN GAS LASER EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a discharge pumping gas laser equipment having an alignment mechanism capable of executing alignment in a state of high repetition oscillation at few kHz and an alignment method therefor. SOLUTION: In a high repetition gas laser equipment with a laser chamber 1 and a narrow-band realizing unit, the unit is constructed in such a way that optical devices including a slit 5, an expanding prism 32 and a grating 31 are housed in easing 4 purged with an inert gas, and the unit is provided with the alignment mechanism 21, 22 and 23 capable of aligning the slit 5 from outside the easing 4 with the slit 5 purged by the inert gas in the easing 4.
申请公布号 JP2002232045(A) 申请公布日期 2002.08.16
申请号 JP20010026404 申请日期 2001.02.02
申请人 USHIO SOGO GIJUTSU KENKYUSHO:KK 发明人 YOSHINO MASAYA
分类号 H01S3/134;H01S3/08;H01S3/086;(IPC1-7):H01S3/086 主分类号 H01S3/134
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