ABRASIVE LIQUID FOR METAL

摘要

PROBLEM TO BE SOLVED: To form a buried pattern which maintains high CMP rate and is excellent in reliability by reducing etching rate sufficiently. SOLUTION: This abrasive liquid for metal contains oxidizing agent of metal (1), metal oxide dissolving agent (2), first protective film forming agent (3) which is amino acid or azole group and with which a protective film is formed on a surface of a metal film by physical sucking and/or formation of chemical bonding, second protective film forming agent (4) which is polyacrylic acid or polyamide acid or salt of polyamide acid and assists the first protective film forming agent to form a protective film, and water (5).