发明名称 PREPARATION OF X-RAY MASK MEMBRANE
摘要 <p>PURPOSE:To obtain an X-ray mask membrane having a quality of compactness and a sufficient strength by a method wherein nitrogen and low aliphatic hydrocarbon are mixed as reactive gases in argon of a carrier gas and reactive ion plating is conducted therewith. CONSTITUTION:A silicon substrate 1 and a heating crucible 5 with boron, an evaporation source, put therein are opposed to each other in a vacuum vessel. Between the crucible 5 and an acceleration electrode 6 an ionizing grid 7 is provided to ionize a reaction gas flowing in. The reaction vessel is evacuated, argon is used as a carrier gas, nitrogen of 1-10 % to an entire gas and also methane, lower aliphatic hydrocarbon, of 1-10 % thereto are mixed as reaction gases in the carrier gas, and reactive ion plating is conducted therewith. Thereby a membrane of hydrogenated boron carbide nitride is formed on the substrate 1. By this method, an X-ray mask membrane having a quality of compactness and a sufficient strength can be obtained.</p>
申请公布号 JPS6340318(A) 申请公布日期 1988.02.20
申请号 JP19860182790 申请日期 1986.08.05
申请人 FUJITSU LTD 发明人 NAKAISHI MASAFUMI;YAMADA MASAO
分类号 G21K1/10;G03F1/00;G03F1/22;H01L21/027;H01L21/30 主分类号 G21K1/10
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