发明名称 APERTURE GRILL AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a high precision aperture grill in which an electron beam transmission ratio is within an extremely narrow range throughout the whole screen zone and also its manufacturing method. SOLUTION: The feature is in that the ratio of transmission into the slit of ray given with an entry angle equivalent to that shown when the CRT electron beam is irradiated to the aperture grill comes down within range of 1% or less throughout the whole screen zone, at any random range of the aperture grill consisting of the tape joint with rivet-shaped cut section to be made via an electric plating method and the slit-portion to be made with tape gaps. The other feature is this aperture grill can shorten the resist pattern gap dimensions in accordance with the distance departing from the screen center to its end, by having the resist layer patterned at the conductor surface, making up the metal layer at the exposed conductor surface to cover a certain portion of the resist layer by an electric plating method, excluding the necessary part of the resist layer and peeling it off from the conductor surface.
申请公布号 JP2002216659(A) 申请公布日期 2002.08.02
申请号 JP20010009427 申请日期 2001.01.17
申请人 SUMITOMO METAL MINING CO LTD 发明人 OGASAWARA SHUICHI;TAKENOUCHI HIROSHI;SAKURADA TAKEHIKO;WATANABE HIROTO
分类号 H01J9/14;H01J29/07;(IPC1-7):H01J29/07 主分类号 H01J9/14
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