发明名称 |
Method for aligning a contact or a line to adjacent phase-shifter on a mask |
摘要 |
A method for fabricating a mask which includes a printable contact and/or line area which is aligned with a phase-shifter. The method includes preparing a mask-in-process comprising a substrate underlying a first layer, an opaque layer overlying the first layer, and a first resist material overlying the opaque layer, and subjecting the mask-in-process to a plurality of exposures and at least one etching to create a phase-shifter and to open a printable contact and/or line area surrounded by a second resist material, wherein the printable contact and/or line area is aligned with the phase-shifter.
|
申请公布号 |
US2002102469(A1) |
申请公布日期 |
2002.08.01 |
申请号 |
US20010770385 |
申请日期 |
2001.01.29 |
申请人 |
DULMAN H. DANIEL;STANTON WILLIAM A. |
发明人 |
DULMAN H. DANIEL;STANTON WILLIAM A. |
分类号 |
G03F1/00;G03F7/00;G03F7/20;(IPC1-7):G03C5/00;G03F9/00 |
主分类号 |
G03F1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|