发明名称 BEAM SCANNER WITH GAS INTRODUCTION FUNCTION
摘要 <p>PROBLEM TO BE SOLVED: To provide a device for preventing a running out of gaseous raw material in a process in which a deposited film is formed or an etching is proceeded in correspondence with the kind of gas by irradiating the surface of a specimen with a beam in the environment of the gas. SOLUTION: The total amount of the gaseous raw material which is to be consumed in the whole process is calculated when the machining process and a machining position for an automatic machining are registered, and a warning signal is displayed for replacing a package of the gaseous raw material with a new one if the residual amount of the gaseous raw material is short for completing the whole registered process. Further, an average consumption of each kind of gas for a day is calculated and possible days before each gaseous raw material is replaced are calculated and displayed.</p>
申请公布号 JP2002210581(A) 申请公布日期 2002.07.30
申请号 JP20010005071 申请日期 2001.01.12
申请人 SEIKO INSTRUMENTS INC 发明人 OI MASAMICHI
分类号 B23K26/12;(IPC1-7):B23K26/12 主分类号 B23K26/12
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