发明名称 Method of making a field emission device with buffer layer
摘要 A field emission device is disclosed having a buffer layer positioned between an underlying cathode conductive layer and an overlying resistor layer. The buffer layer consists of substantially undoped amorphous silicon. Any pinhole defects or discontinuities that extend through the resistor layer terminate at the buffer layer, thereby preventing the problems otherwise caused by pinhole defects. In particular, the buffer layer prevents breakdown of the resistor layer, thereby reducing the possibility of short circuiting. The buffer layer further reduces the risk of delamination of various layers or other irregularities arising from subsequent processing steps. Also disclosed are methods of making and using the field emission device having the buffer layer.
申请公布号 US6425791(B1) 申请公布日期 2002.07.30
申请号 US20000652746 申请日期 2000.08.31
申请人 MICRON TECHNOLOGY, INC. 发明人 RAINA KANWAL K.;ALWAN JAMES J.
分类号 H01J1/304;H01J31/12;(IPC1-7):H01J9/02 主分类号 H01J1/304
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