| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a method for correcting alignment through which out-of specification displacement can be prevented, and a method for producing a semiconductor device. SOLUTION: This production system of semiconductor device controls a base pattern 100 which corresponds to a pattern 200 in a semiconductor device and the quantity of rotation of a lower substrate from the position of reference axis of±0 to the central axis to the pattern 100. The production system generates a value added with the quantity of rotation of the lower substrate of the pattern 100 to determine a correction value for stepper for positioning the pattern 200 and gives it to the stepper for setting. As a result, out-of specification displacement between lower and upper substrates can be prevented.</p> |
