发明名称 SURFACE ACOUSTIC WAVE DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a surface acoustic wave device which has a small propagation loss, a large electrode reflection coefficient, of which the bandwidth can be extended and which can be downsized. SOLUTION: The surface acoustic wave device 1 is characterized in that a ZnO thin film 3 is epitaxially grown on an R face sapphire substrate 2, an IDT 4 is formed on the ZnO thin film 3 in a way that the electrode finger extends in a direction of the c axis of the ZnO thin film 3 and a fundamental wave of an SH wave is propagated in a direction orthogonal to the c axis direction.
申请公布号 JP2002198775(A) 申请公布日期 2002.07.12
申请号 JP20000390912 申请日期 2000.12.22
申请人 MURATA MFG CO LTD 发明人 KAWAKATSU KOJI;TANAKA NOBUNARI;KADOTA MICHIO
分类号 H03H9/25;H03H3/08;H03H9/145;(IPC1-7):H03H9/25 主分类号 H03H9/25
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