发明名称 Composition for vapor deposition, method for forming an antireflection film, and optical element
摘要 A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.
申请公布号 US2002089751(A1) 申请公布日期 2002.07.11
申请号 US20010986907 申请日期 2001.11.13
申请人 HOYA CORPORATION 发明人 MITSUISHI TAKESHI;KAMURA HITOSHI;SHINDE KENICHI;TAKEI HIROKI;KOBAYASHI AKINORI;TAKAHASHI YUKIHIRO;WATANABE YUKO
分类号 G02C7/02;B32B9/00;C23C14/08;C23C14/24;G02B1/10;G02B1/11;(IPC1-7):G02B1/10 主分类号 G02C7/02
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