发明名称 |
Composition for vapor deposition, method for forming an antireflection film, and optical element |
摘要 |
A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.
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申请公布号 |
US2002089751(A1) |
申请公布日期 |
2002.07.11 |
申请号 |
US20010986907 |
申请日期 |
2001.11.13 |
申请人 |
HOYA CORPORATION |
发明人 |
MITSUISHI TAKESHI;KAMURA HITOSHI;SHINDE KENICHI;TAKEI HIROKI;KOBAYASHI AKINORI;TAKAHASHI YUKIHIRO;WATANABE YUKO |
分类号 |
G02C7/02;B32B9/00;C23C14/08;C23C14/24;G02B1/10;G02B1/11;(IPC1-7):G02B1/10 |
主分类号 |
G02C7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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