发明名称 CHEMICAL/MECHANICAL ABRASIVE PAD AND METHOD FOR PRODUCING THE SAME
摘要 PURPOSE: Provided are a chemical/mechanical abrasive pad which can eliminate a scratch phenomenon of existing impregnated pad and show excellent chemical/mechanical abrasive property, and a method for producing the same. CONSTITUTION: The method comprises the steps of: (i) binding a compound having bifunctionality with abrasive particle(32) to form heterogeneous abrasive, and (ii) curing a liquid comprising the heterogeneous abrasive and pad monomer to form an abrasive impregnated pad(33). The abrasive particle is silicon oxide, aluminum oxide, and tantalum oxide. The abrasive particle has a particle size of 0.1-1 micrometer. The mixing ratio of the abrasive particle and the pad monomer is 0.25-0.5:1. The compound used in the impregnated pad is any material comprising an electron donating group and a crosslinking group.
申请公布号 KR20020055308(A) 申请公布日期 2002.07.08
申请号 KR20000084732 申请日期 2000.12.28
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM, JAE HONG
分类号 C09K3/14 主分类号 C09K3/14
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