发明名称 Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
摘要 Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a substrate, and a sonic box in the processing chamber for supplying sonic waves substantially perpendicularly to the substrate. The sonic box may comprises a membrane, and a transducer coupled to the membrane.
申请公布号 US7033068(B2) 申请公布日期 2006.04.25
申请号 US20050073060 申请日期 2005.03.04
申请人 TECHSONIC 发明人 CHING GIL;PERRUT VINCENT;RUCH VINCENT;FRESQUET GILLES
分类号 B01F11/00;B01D21/00;B08B3/12;B08B6/00;B08B7/00;C25F1/00;H01L21/00;H01L21/02 主分类号 B01F11/00
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