发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method which prevents generation of leakage currents, without using a protective diode in a method for manufacturing a semiconductor device where the edge part of a diaphragm is rounded by using isotropic electrochemical etching. SOLUTION: The width of a wiring 5 for applying a voltage is made narrower than the width W of a dicing plate, so that the wiring 5, which becomes a cause of generation of a leakage current when dicing cut, can be completely eliminated. As a result, residue of the wiring 5 does not exist, after the dicing, and the wiring 5 does not stick also on the ruptured surface of a chip. Hence a method for manufacturing a pressure sensor can be provided where a leakage current is not generated, without using the protective diode which is arranged for preventing a leakage current in the conventional technique.
申请公布号 JP2002190607(A) 申请公布日期 2002.07.05
申请号 JP20000390855 申请日期 2000.12.22
申请人 DENSO CORP 发明人 YOSHIHARA SHINJI;SUZUKI YASUTOSHI
分类号 G01L9/04;G01L9/00;G01P15/08;G01P15/12;H01L21/3063;H01L29/84;(IPC1-7):H01L29/84;H01L21/306 主分类号 G01L9/04
代理机构 代理人
主权项
地址
您可能感兴趣的专利