| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a production method capable of easily giving a gray tone mask having high uniformity of thickness of a translucent film. SOLUTION: A translucent film 12 (CrO or the like), an etching stopper film 13 (SiO2 or the like), a light shielding film 14 (Cr or the like) and a resist film 15 are successively formed on a transparent substrate 11. The resist film 15 on a part where a light transmissive part is formed (area C) is removed and the light shielding film 14 and the etching stopper film 13 on this part are removed. The resist on a part where a translucent part is formed (area A) is then removed, the light shielding film 14 on this part is removed to form the translucent part and the translucent film 12 on the area C is removed to form the light transmissive part. The objective gray tone mask is thus produced.</p> |
