发明名称 |
CLEANING APPARATUS FOR WASTE PROCESSING SYSTEM |
摘要 |
<p>PROBLEM TO BE SOLVED: To further reduce the number of constituting apparatuses of a waste processing system than that of a conventional type. SOLUTION: After a cleaning apparatus 3 causes decomposed gas from a condenser 3 to make direct contact with cleaning liquid 13, the cracked gas is fed to an off gas treating device. The cleaning liquid 13 dissolves chlorine gas and has nature to prevent the occurrence of a backfire from the off gas treating device.</p> |
申请公布号 |
JP2002188803(A) |
申请公布日期 |
2002.07.05 |
申请号 |
JP20000384680 |
申请日期 |
2000.12.19 |
申请人 |
FUJI ELECTRIC CO LTD |
发明人 |
TSUTSUMI RIKUO;OMACHI SHINSUKE;HAYASHI SHIZUO;KIDA KIYONORI;KOSHIBA KAZUYOSHI;MIYAMOTO MASAHIRO;WADA KIYOMI |
分类号 |
F23G5/027;B01D53/34;B01D53/77;F23G5/14;F23J15/02;(IPC1-7):F23G5/027 |
主分类号 |
F23G5/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|