METHOD AND APPARATUS FOR FORMING THIN FILM

摘要

PURPOSE: To provide a method and an apparatus for forming a thin film, which can lower voltage of a plasma display panel and enhance the luminous efficiency, by forming a protective coating of high quality with a high deposition rate in low cost. CONSTITUTION: This method comprises controlling a pressure inside of the reaction vessel 1 to a predetermined value with sputtering gas introduced, along with discharging air in a reaction vessel 1 to a vacuum condition applying high frequency voltage to a holding means 5 for holding a film forming material 4 to generate plasma changing the film forming material 4 to clusters, by sputtering the film forming material 4 with the plasma, while activating the surface of the film forming material 4 by an activation means 11 and depositing the clustered film-forming material 4 on a substance to be treated 3 to form the film.