| 发明名称 |
Dielectric covered electrostatic chuck |
| 摘要 |
An electrostatic chuck 100 useful for holding a substrate 55 in a high density plasma, comprises an electrode 110 at least partially covered by a semiconducting dielectric 115, wherein the semiconducting dielectric 115 may have an electrical resistance of from about 5x109 OMEGAcm to about 8x1010 OMEGAcm.
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| 申请公布号 |
US6414834(B1) |
申请公布日期 |
2002.07.02 |
| 申请号 |
US20000596108 |
申请日期 |
2000.06.16 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
WELDON EDWIN C.;COLLINS KENNETH S.;DONDE ARIK;LUE BRIAN;MAYDAN DAN;STEGER ROBERT J.;DYER TIMOTHY;KUMAR ANANDA H.;VEYTSER ALEXANDER M.;NARENDRNATH KADTHALA R.;KATS SEMYON L.;KHOLODENKO ARNOLD;SHAMOUILIAN SHAMOUIL;GRIMARD DENNIS S. |
| 分类号 |
B23Q3/15;C23C16/458;H01L21/683;(IPC1-7):H02N13/00 |
主分类号 |
B23Q3/15 |
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