METHOD FOR MANUFACTURING PHASE SHIFTING MASK

摘要

PURPOSE: A fabrication method of a PSM(Phase Shifting Mask) is provided to prevent defects of patterns and to simplify the manufacturing processes. CONSTITUTION: A field region and an active region are defined by forming a field oxide(22) on a quartz substrate(21). A light shield layer(23) is formed on the active region of the quartz substrate. A phase shifting layer(25) is formed by sequentially implanting a dopant having different dose and energy and by annealing. At this time, the phase shifting layer(25) has a continuous refractive index in accordance with a depth. An oxynitride layer is used as the phase shifting layer(25) by using nitrogen as the dopant.